L'url de cette page a bien été copiée dans votre presse-papier!
Reference
20120001_1813
Bâti de gravure de silicium DRIE (Deep reactive ion etching), permettant de faire de la gravure prof
Bâti de gravure de silicium DRIE (Deep reactive ion etching), permettant de faire de la gravure profonde, en salle blanche. Ici, un wafer est mis dans le sas de chargement.
The use of media visible on the CNRS Images Platform can be granted on request. Any reproduction or representation is forbidden without prior authorization from CNRS Images (except for resources under Creative Commons license).
No modification of an image may be made without the prior consent of CNRS Images.
No use of an image for advertising purposes or distribution to a third party may be made without the prior agreement of CNRS Images.
Our work is guided by the way scientists question the world around them and we translate their research into images to help people to understand the world better and to awaken their curiosity and wonderment.
