Production year
2003
© Hubert RAGUET/THALES/CNRS Images
20030001_0567
Fabrication par lithographie optique de jonctions tunnel magnétiques (MTJ). A la fin du procédé de microlithographie, la plaquette (substrat de silicium, zone verte) contient un grand nombre de jonctions tunnel magnétiques submicroniques (croix jaunes sur l'image). La magnétorésistance tunnel aura des applications importantes pour la réalisation de mémoires électroniques (technologie des ordinateurs).
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2003
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