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Reference
20170023_0037
Contrôle des paramètres pendant la phase de dépôt dans une chambre d’évaporation thermique
Checking of parameters during the deposition phase in a thermal evaporation chamber used for the production of thin layers under ultra-high vacuum. This chamber is intended for the deposition of magnetic nanostructures for spintronics and is part of an experimental vacuum unit, also comprising a treatment chamber and a cathode sputtering chamber.
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