Production year
2012
© Cyril FRESILLON/CNRS Images
20130001_0121
Mise en place d'un échantillon pour un dépôt métallique dans un bâti de dépôt thermique par effet joule, dépôt par plasma-sputtering et dépôt thermique assisté par faisceau d'électrons. Les applications de cet appareil sont la fabrication de couches minces à façon.
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2012
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