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Reference
20170023_0039
Chambre d’évaporation thermique pour la réalisation de couches minces sous ultravide
Thermal evaporation chamber for the production of thin layers under ultra-high vacuum. Control of deposition parameters for electron beam evaporation and observation through porthole. This chamber is intended for the deposition of magnetic nanostructures for spintronics and is part of an experimental vacuum unit, also comprising a treatment chamber and a cathode sputtering chamber.
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