Production year
2015
© Cyril FRESILLON/INL/CNRS Images
20150001_0531
Insertion d'une plaquette de silicium dans un appareil comportant un laser UV pour l'ablation de couches minces ou pour un recuit localisé. Cette opération permet un dopage localisé sur la face et / ou la face arrière de la plaquette de silicium. Elle fait partie des étapes permettant de la transformer en cellule photovoltaïque. Cette technique vise à améliorer le rendement des cellules photovoltaïques en silicium cristallin.
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2015
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