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Reference
20170023_0032
Sas d’introduction des échantillons dans une chambre de pulvérisation cathodique
Airlock for the introduction of samples into a cathode sputtering chamber. Observation and transfer of a sample in this chamber. It is intended for the deposition of magnetic nanostructures for spintronics and is part of an experimental vacuum unit, also comprising a treatment chamber and a thermal evaporation chamber.
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