Production year
2009
© Alexis CHEZIERE/CNRS Images
20090001_1341
Goutte millimétrique impactant sur un substrat en silicium chauffé à 325°C. Lors de son impact, la goutte se désintègre (splash) en une multitude de gouttelettes qui partent dans toutes les directions. L'objectif de la recherche est de déterminer l'influence de défauts solides sur la surface, sur le "seuil de splash". Ce seuil correspond à la vitesse seuil de la goutte pour laquelle cette dernière va se fragmenter en petites gouttes satellites ou non.
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2009
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